PELCO^® CLEM Silicon Support
Grids with Silicon Nitride Membranes

3.0mm major diameter with two parallel 1mm flats for repeatable alignment		FE-SEM image of flat

These silicon support grids with silicon nitride membranes have frames that are specially truncated with two parallel flats, which act as an aid for specimen alignment in Correlative Light & Electron Microscopy (CLEM) experiments. The CLEM grids are 200µm thick and 3mm in diameter, with two 1mm-long parallel flat edges on both sides. The silicon nitride films are available in four different thicknesses: 15 nm 50 nm, 100 nm and 200 nm, with a variety of aperture sizes from 0.1 x 0.1mm to 1 x 1mm.

• The durability of the silicon nitride support film allows cells to be cultured directly on them.
• Two CLEM grids can be glued together to construct a sealed, liquid-filled chamber, allowing the samples to remain in fluid while imaging in an electron microscope. Sealing can be done with either a fast-curing epoxy glue #14422 or M-Bond® 610 #16039. 
• The presence of the parallel flats on both sides of the CLEM grid allows the orientation and alignment of the sample to be maintained when using different imaging techniques.

1 x 1mm	0.75 x 0.75mm	0.5 x 0.5mm	0.25 x 0.25mm	0.5 x 1.5mm	0.1 x 1.5mm	0.1 x 0.1mm

PELCO^® CLEM Silicon Support Grids with Apertures

The edges of these silicon frames are specially truncated with two parallel flats, which act as an aid for specimen alignment in Correlative Light & Electron Microscopy (CLEM) experiments. These CLEM grids without a silicon nitride membrane are available in a variety of different size apertures and patterns. The CLEM grids are 200 µm thick and 3 mm in diameter with two 1 mm-long parallel flat edges on both sides. The grids have a 50 nm silicon nitride layer on the back side with bare silicon on the front side. Use of the parallel flats on both sides of the CLEM grid allows the orientation and alignment of the sample to be maintained when using different imaging techniques.