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A selection of premium polishing cloths for coarse and fine polishing of hard, soft and composite materials. Cloths are available with plain, magnetic or PSA backing for easy mounting on the polishing platen. Plain polishing cloths need to be clamped on the edge of the polishing platen with a clamping ring. To facilitate this these cloths are approximately 2" larger than the polishing platen so that the cloth folds over the edge of the platen for clamping. 8" plain polishing cloths are 10" diameter. Our polishing cloths can be used with diamond compound, diamond slurry / suspension, diamond spray, alumina suspension or colloidal silica.
Hard Cloths
NOTE: Cloths can be used in more than one stage of the polishing process, and some are included in more than one category. The best cloth for a given polishing step will depend on the particular process. The table above gives general guidlines, but for any polishing process, some experimentation will be needed.
Nylon Polishing Cloth
Adhesive back for polishing most materials with diamond or alumina while maintaining flatness.
Comparable performance to former South Bay Technology PNY08A-10.
Met-X Polishing Cloth
Adhesive back. Popular first polish cloth for diamond, high cutting rate with good edge retention.
Comparable performance to former South Bay Technology PCNW08A-10.
Cotton (high grade) Polishing Cloth
Plain back. Natural, low nap first polish cotton cloth used on soft materials with diamond, alumina and oxides.
NEW PELCO® M525 Polishing Cloth
Non-woven polyester fiber polishing pad for general polishing. Available with PSA or magnetic backing.
NEW PELCO® M910 Polishing Cloth
Laminated viscose and polyester bound in resin polishing pad with perforations provides a substrate for easy stock removal on metallographic samples. Available with PSA or magnetic backing.
Alpha-A Polishing Cloth
Plain and adhesive back. Popular final polish, low nap cloth used with diamond or alumina for most materials.
Comparable performance to former South Bay Technology PCM08A-10.
Alpha-B Polishing Cloth
Low nap mylar backed variation of Alpha-A for final polishing of most materials, not used with alcohol thinners.
Selvyt Polishing Cloth
Plain back. Cotton medium nap used for first and final polishing of metals and ceramics with alumina.
PELCO® HS Polishing Cloth
Adhesive back. Satin weave acetate silk. Produces a good finish without edge rounding. Recommended for polishing of plastics.
Comparable performance to former South Bay Technology PAS08-10.
NEW PELCO® CE Polishing Cloth
Cerium oxide-filled polyurethane polishing disc for high stock removal and excellent flatness across a range of materials. Available with PSA or magnetic backing.
NEW Red Felt Polishing Cloth
Napped wool polishing cloth for intermediate polishing of soft metals. Available with PSA backing.
Comparable performance to former South Bay Technology PRE08A-10.
Synthetic Velvet Cloth
For intermediate and final polishing. This is an adhesive-backed short nap cloth with thin fabric backing for high quality finishing with minimal relief or edge rounding.
Equivalent performance to former South Bay Technology PSV08A-10.
Rayon Velvet Cloth
Plain back. Synthetic rayon velvet for polishing and final polishing soft materials such as gold, lead and tin with alumina.
Multi-Tex Cloth
A superior fine polishing cloth with short nap for obtaining an optical quality finish. Compatible with diamond pastes and suspensions, alumina suspensions & colloidal silica.
Equivalent performance to former South Bay Technology PMT08A-10.
Final B Polishing Cloth
Adhesive back. Short nap used for first and final polishing. Popular choice for semiconductor delayering with diamond slurries and suspensions.
PELCO® HB Polishing Cloth
Adhesive back. Soft, short nap viscose fibers used for final polishing. Available with PSA or magnetic backing.
Comparable performance to former South Bay Technology PRA08A-10.
PELCO® Short Nap Red Polishing Cloth
Adhesive back. Extra soft, short nap used for first and final polishing. Popular choice for semiconductor delayering with diamond slurries and suspensions-- comparable performance to Final C. Available in regular PSA (816-112) or PSA with a stiff plastic sealing layer between the PSA and cloth (816-113). Available with PSA or magnetic backing.
Comparable performance to former South Bay Technology PRF08A-10.
NEW PELCO® Chempad Polishing Cloth
Porous polyurethane foam for final polishing of semiconductor and optical material-- plain or embossed. Available with PSA or magnetic backing.
NEW PELCO® Magnetic Backing
Adhesive back. Magnetic disc for converting a non-magnetic platen or polishing pad to magnetic.
Powerful replacement for mineral spirits, solvents and other unfriendly cleaners. Ideally suited for removing used grinding/lapping/polishing discs with PSA backing from their support discs. New food-grade citrus-based 3M™ Adhesive Remover is also very effective in removing overspray of any aerosol adhesives, grease, oil, grime, tape residue, tar, wax, etc. A solvent-free formulation that provides wipe-away convenience with no filmy residue. No CFC's. Active ingredient is listed as GRAS (Generally Regarded As Safe) for food contact applications under FDA21 CFR 182.20.
Flammable propellent (propane). Note: Not for sale in California. I, F - SDS (48KB PDF)